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Extended Abstracts of the 2009 International Conference on Solid State Devices and MaterialsConference publication

AFM Nanolithography of Graphene

L. Rokhinson, L. Weng, L. Zhang, Y. P. Chen

Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials · SSDM 2009, G-9-1, Sendai (2009)

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DOI 10.7567/ssdm.2009.g-9-1

AI thematic illustrationConcept artwork created for this paper.

Introduction

This SSDM contribution from Purdue University discussed patterning graphene with an atomic force microscope. The team's companion journal article shows how the method can cut insulating trenches and define a nanoribbon and a submicrometre ring.

A closer reading

The microscope tip doubles as a writing tool as well as a way to inspect the surface. Reading this contribution alongside the group's journal article helps explain why the same tip can leave either a trench or a raised feature under different writing conditions.

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